90. Young-Gi Kim, H. J. Yeom, Deuk-Chul Kwon, Kwan-Yong Kim, Gwang-Seok Chae, Jung-Sik Yoon, Junghyung Kim*, and Hyo-Chang

       Lee*, "Effect of impurities in vacuum vessels on the plasma parameters in inductive discharges", Vacuum 215 (2023).

      DOI : https://doi.org/10.1016/j.vacuum.2023.112330

​

89. Min Young Yoon, Jong-Ryul Jeong, Hyo-Chang Lee*, and Jung-Hyung Kim*, "Plasma low-energy ion flux induced vertical graphene 

      synthesis", Applied Surface Science 636 (2023) 157814, JCR rank 1/23

      DOI : https://doi.org/10.1016/j.apsusc.2023.157814

​

88. Dong Hyun Seo, Ju Won Kim, Jin‑Hoo Seong, Hyo‑Chang Lee, Sang‑il Kim, TaeWan Kim*, "Characteristics of rhombohedral (3R)

      structure of α-In2Se3 nanosheets by mechanical exfoliation, Electronic Materials Letters", Electronic Materials Letters (2023).

      DOI : https://doi.org/10.1007/s13391-023-00439-y

 

87. H. J. Yeom, Young-Gi Kim, Gwang-Seok Chae, Do-Yeon Hwang, Junghyung Kim*, and Hyo-Chang Lee*, "Analysis of the                          transmission spectrum of the microwave cutoff probe influenced by the sheath around the probe", Journal of Applied Physics 133,          183302 (2023)

      DOI : https://doi.org/10.1063/5.0145958

​

86. H. J. Yeom, Gwang-Seok Chae, Junghyung Kim*, ShinJae You* and Hyo-Chang Lee*, "Analysis of the transmission spectrum of the 

      flat-cutoff sensors on wafers with metal layer", Journal of Applied Physics 133 153302 (2023), Editor's Picks Paper

      DOI : https://doi.org/10.1063/5.0143763

​

85. H. J. Yeom, Min Young Yoon, Gwang-Seok Chae, Junghyung Kim*, ShinJae You and Hyo-Chang Lee*, "Real-time monitoring of the

      plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor", Applied Physics Letters 122 114103 (2023)

      DOI : https://doi.org/10.1063/5.0129790

84. Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee*, and ShinJae You*,

      "Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe",

       Nanomaterials 2022 12 3828 (2022)

       DOI : https://doi.org/10.3390/nano12213828

​

83. Ho Jin Ma*, Seongwan Hong, Hyeon-Myeong Oh, Kundan Kumar, Mi-Ju Kim, Ha-Neul Kim, Jae-Woong Ko, Jae-Wook Lee, Hyo-

      Chang Lee, and Young-Jo Park*, "Correlation with the Microstructure and Synergistic Physiochemical Etching Resistance of

      Nanocomposites under Fluorine-Containing Plasma Conditions", ACS Applied Materials and Interfaces 14 (2022)

      DOI : https://doi.org/10.1021/acsami.2c12311

​

82. Kwan-Yong Kim, Jung Hyung Kim, Chin-Wook Chung, and Hyo-Chang Lee*, "Effect of electron energy distributions on the electron        density in nitrogen inductively coupled plasmas", Plasma Sources Sci. technol. 31 105007 (2022)

      DOI : https://doi.org/10.1088/1361-6595/ac942b

​

81. Min Young Yoon, H. J. Yeom, J. H. Kim, Jong-Ryul Jeong* and Hyo-Chang Lee*, "Plasma etching of the trench pattern with high              aspect ratio mask under ion tilting", Applied Surface Science 153462 (2022), JCR rank 1/23

      DOI : https://doi.org/10.1016/j.apsusc.2022.153462

​

80. Hyo-Chang Lee*, "Preface to Special Topic “Plasma Physics and Science in Current and Next Generation Semiconductor Process”:

      Invited papers from The 8th International Conference on Microelectronics andPlasmaTechnology", Phys. Plasmas 29, 040401 (2022)

      DOI : https://doi.org/10.1063/5.0093975

​

79. June Young Kim, Igors Kaganovich, and Hyo-Chang Lee*, "Review of the gas breakdown physics and nanomaterial-based                       ionization gas sensors and their applications", Plasma Sources Sci. Technol. 31 033001 (2022), Invited paper

       DOI : https://doi.org/10.1088/1361-6595/ac4574

78. Daehan Choi, Donghwan Kim, Yonghee Jo, J. H. Kim, Euijoon Yoon, Hyo-Chang Lee* and TaeWan Kim* , “Directly grown Te                    nanowire electrodes and soft plasma etching for high-performance MoTe2 field-effect transistors”, Applied Surface Science 565              110521 (2021)

      DOI : https://doi.org/10.1016/j.apsusc.2021.150521

 

77. H. J. Yeom, K. H. You, J. H. Kim and Hyo-Chang Lee*, “Circuit model for flat cut-off probes with coplanar capacitance”, Plasma

      Sources Sci. Technol. 30 065012 (2021)

      DOI : https://doi.org/10.1088/1361-6595/abef1a

 

76. Min Young Yoon, H. J. Yeom, J. H. Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong and Hyo-Chang Lee*,

      “Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias”, Phys. Plasmas

       28 063504 (2021), Featured article, Invited paper

       DOI : https://doi.org/10.1063/5.0047811

​

75. Daehan Choi, J. H. Kim, Deuk Chul Kwon, Chae Ho Shin, Hyun Ryu, Euijoon Yoon and Hyo-Chang Lee*, “Crystalline silicon

      nanoparticle formation by tailored plasma irradiation: self-structurization, nucleation and growth acceleration, and size control”,

      Nanoscale. 5 15254 (2015), Back cover

      DOI : https://doi.org/10.1039/d1nr00628b

 

74. Hyo-Chang Lee*, C-W Chung*, M. H. Lee, J. H. Kim, “Noninvasive method to measure the electron temperature in radio frequency

      capacitively coupled plasmas”, Appl. Phys. Lett., 118 204101 (2021)

      DOI : https://doi.org/10.1063/5.0049186