PUBLICATION
“Science increases our power in proportion as it lowers our pride.”
- Claude Bernard -
SCI journal
2021
51. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
50. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
49. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
48. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
47. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
46. YC Kim, YS Kim, Hyo-Chang Lee, JH Moon , C-W Chung, YJ Kim , G Cho, “Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source”, Phys. Plasmas, 22 083511 (2015).
45. Seung-Ju Oh, Hyo-Chang Lee, and Chin-Wook Chung, “Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma”, IEEE Trans. Plasma Sci, 43 2766 (2015).
44. D. Han, Hyo-Chang Lee, J. Y. Bang, C.W. Chung, S. Y. Moon, “Measurements of the spatially resolved electron temperature and plasma potential in ferrite-core side type Ar/He inductively-coupled plasmas”, Curr. Appl. Phys. 15 S1567 (2015).
43. Yu Sin Kim , Donghwan Kim , Hyo-Chang Lee, Chin-Wook Chung, "Pulsed plasma measurement method using harmonic analysis", J. Appl. Phys. 117 243302 (2015)
42. Hyo-Chang Lee and Chin-Wook Chung, “E-H heating mode transition in inductive discharges with different antenna sizes”, Phys. Plasmas, 22 053505 (2015).
41. Hyo-Chang Lee and Chin-Wook Chung, “Electron Heating and Control of Electron Energy Distribution for Enhancement of Plasma Ashing Processing”, Plasma Sources Sci. Technol., 24, 024001 (2015) [Selected to the Plasma Sources Science and Technology highlights of 2015 (http://iopscience.iop.org/0963-0252/page/Highlights-of-2015)].
40. Y-C Kim , J Y Kim, Hyo-Chang Lee, Y Kim, J Kim, S-W Cho, C.-W. Chung, “The experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas”, Appl. Phys. Lett., 106, 074103 (2015).
39. S-H Kwon, HJ Choe, Hyo-Chang Lee, C-W Chung, J-J Lee, “Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting”, Journal of Nanoscience and Nanotechnology., 15 2542 (2015). 2015.03.01
39. S-H Kwon, HJ Choe, Hyo-Chang Lee, C-W Chung, J-J Lee, “Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting”, Journal of Nanoscience and Nanotechnology., 15 2542 (2015). 2015.03.01
2020
51. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
50. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
49. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
48. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
47. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
46. YC Kim, YS Kim, Hyo-Chang Lee, JH Moon , C-W Chung, YJ Kim , G Cho, “Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source”, Phys. Plasmas, 22 083511 (2015).
45. Seung-Ju Oh, Hyo-Chang Lee, and Chin-Wook Chung, “Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma”, IEEE Trans. Plasma Sci, 43 2766 (2015).
2019
51. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
50. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
49. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
48. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
47. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
46. YC Kim, YS Kim, Hyo-Chang Lee, JH Moon , C-W Chung, YJ Kim , G Cho, “Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source”, Phys. Plasmas, 22 083511 (2015).
45. Seung-Ju Oh, Hyo-Chang Lee, and Chin-Wook Chung, “Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma”, IEEE Trans. Plasma Sci, 43 2766 (2015).
2018
51. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
50. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
49. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
48. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
47. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
46. YC Kim, YS Kim, Hyo-Chang Lee, JH Moon , C-W Chung, YJ Kim , G Cho, “Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source”, Phys. Plasmas, 22 083511 (2015).
45. Seung-Ju Oh, Hyo-Chang Lee, and Chin-Wook Chung, “Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma”, IEEE Trans. Plasma Sci, 43 2766 (2015).
SCI journal
2025
112. Min Young Yoon, Hee Jung Yeom, Jong-Ryul Jeong, Hyo-Chang Lee*, Jung-Hyung Kim*, "Effect of SiH4 fragments and H radicals on nc-Si:H film deposition in an inductively coupled plasma PECVD", Surfaces and Interfaces, 60 106040 (2025)
https://doi.org/10.1016/j.surfin.2025.106040
111. Yu-Bin Shin, Su Been Ham, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Young-Jo Park, Jung-Hyung Kim, Hyo-Chang Lee, Young Hwa Jung, Jung Woo Lee*, Ho Jin Ma*,"Novel transparent high-entropy sesquioxide ceramics with high physicochemical plasma etching resistance", Journal of Advanced Ceramics, 14: 9221013 (2025)
https://doi.org/10.26599/JAC.2024.9221013
2024
110. Hee-Jung Yeom, Gwang-Seok Chae, Jung-Hyung Kim*, Hyo-Chang Lee*,"Analysis of uncertainty in measurement of electron temperature in low-pressure inductively coupled plasmas using microwave cutoff probe", Plasma Sources Sci. Technol. 33 115014 (2024)
https://doi.org/10.1088/1361-6595/ad9054
109. Seong-Bin Park, Hee-Jung Yeom, Do-Yeon Hwang, Young-Joo Kim*, Hyo-Chang Lee*, Jung-Hyung Kim*,"Measurement of electron density in high-pressure plasma using a microwave cutoff probe", J. Appl. Phys. 136, 243301 (2024)
https://doi.org/10.1063/5.0233192
108. Oscar Versolato*, Igor Kaganovich, Kallol Bera, Thorsten Lill, Hyo-Chang Lee, Ronnie Hoekstra, John Sheil, Sang Ki Nam, "Plasma sources for advanced semiconductor applications ", Applied Physics Letters, 125, 230401 (2024)
https://doi.org/10.1063/5.0247819
107. Gwang-Seok Chae, Hee-Jung Yeom, Min Young Yoon, Jung-Hyung Kim*, Hyo-chang Lee*, "Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics", Plasma Sources Science and Technology, Voume 33, Number 11 (2024)
https://doi.org/10.1088/1361-6595/ad8ae6
106. Minji Kang, Sung Kyu Jang, Jihun Kim, Seongho Kim, Changmin Kim, Hyo-Chang Lee, Wooseok Kang, Min Sup Choi, Hyeongkeun Kim and Hyeong-U Kim, "Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN", J. Sens. Actuator Netw. 13, 75 (2024).
https://doi.org/10.3390/jsan13060075
105. Ji Hoon Kim, Min Young Yoon, Gwan Kim, Deuk-Chul Kwon, Hyo-Chang Lee, Jung-Hyung Kim, Hee Hwan Choe*,"Numerical Investigation of Plasma Properties in Ar/SiH4 Inductively Coupled Plasmas Considering Electron Energy Distribution Functions", Journal of Applied Physics (2024 ) https://doi.org/10.1063/5.0223700
104. Jae-Heon Lee, Hee-Jung Yeom, Gwang-Seok Chae, Jung-Hyung Kim*, Hyo-Chang Lee*,"Effect of Probe Structure on Wave Transmission Spectra of Microwave Cutoff Probe", Journal of Applied Physics, 136, 083302 (2024)
https://doi.org/10.1063/5.0221290
103. Hee-Jung Yeom, Gwang-Seok Chae, Min Young Yoon, Wooram Kim, Jae-Heon Lee, Jun Hyung Park, Chan-Woo park, Jung-Hyung Kim*, Hyo-Chang Lee*."Effect of Radiofrequency Bias Power on Transmission Spectrum of Flat-Cutoff Sensor in Inductively Coupled Plasma", Physics of Plasmas, (2024)
https://doi.org/10.1063/5.0221016
102. Ho Jin Ma*, Seonghyeon Kim, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Jung-Hyung Kim*, Hyo-Chang Lee*, Young-Jo Park*, "Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y2O3–Y4Al2O9 composite under CF4ArO2 mixed gas conditions", Scientific reports, 14-7008 (2024) https://doi.org/10.1038/s41598-024-57697-5
101. Su Been Ham, Yu-Bin Shin, Seonghyeon Kim, Ha-Neul Kim, Mi-Ju Kim, Jae-Woong Ko, Jae-Wook Lee, Yong-Jo Park, Jung-Hyung Kim, Hyo-Chang Lee, Seog-Young Yoon, Ho Jin Ma, "Plasma etching resistance and mechanical properties of polymorph-
Gd2O3-MgO nanocomposite with Zr phase stabilizer incorporation", Applied Surface Science, 672, 160890 (2024)
https://doi.org/10.1016/j.apsusc.2024.160890
100. Do-Yeon Hwang, Hee-Jung Yeom, Gawon Lee, Jung-Hyung kim*, Hyeo-Chang Lee*, "Transmission spectrum analysis of ceramic-shielded microwave cutoff probes in low-pressure plasmas",Journal of Applied Physics(2024),135(22):223305
https://doi.org/10.1063/5.0214696
99. Keon-Woo Kim, Hyunho Seok, Sihoon Son, Su-Jeong Park, Chanwoo Yang, Dongho Lee, Hyo-Chang Lee, Jihun Mun, Hee-Jung Yeomm, Min Young Yoon, Bomi Park, Se Hyun Kim, Changshin Jo, Hong Chul Moon, Taesung Kim, Jin Kon Kim, "Low-Temperature, Universal Synthetic Route for Mesoporous Metal Oxides by Exploiting Synergistic Effect of Thermal Activation and Plasma", Advanced Materials (2024, accepted), https://doi.org/10.1002/adma.202311809
98. Hun Shim, Hyung-Ho Kim, Seongwan Hong, Jung-Hyung Kim, Hyo-Chang Lee, Young-Jo Park, Sung-Min Lee, Seong-Hyeon Hong*, "Grain size effect on the plasma etching behavior of spark plasma sintered yttria-stabilized zirconia ceramics, Ceramics International 50 2096 (2024), https://doi.org/10.1016/j.ceramint.2023.10.317
97. Gunhoo Woo, Jinill Cho, Heejung Yeom, Min Young Yoon, Geon Woong Eom, Muyoung Kim, Jihun Mun, Hyo Chang Lee, Hyeong-U Kim, Hochenon Yoo, and Taesung Kim, "Temperature Dependent Phase Transition in WS2 for Reinforcing Band-to-band Tunneling and Photoreactive Random Access Memory Application, Small Science, 4 2300202 (2024), https://doi.org/10.1002/smsc.202300202
2023
96. Eun-Seok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, Hee-Jung Yeom, Min Young Yoon, Seongwan Hong, Dong-Wook Kim, Jung-Hyung Kim*, Hyo-Chang Lee*, "Evaluation of H2 Plasma-Induced Damage in Materials for EUV Lithography", Advanced Materials Interfaces, Volume 11, Issue 7 2300867 (2023), https://doi.org/10.1002/admi.202300867
95. Sung Hyun Son, Geunwoo Go, Willca Villafana, Igor D. Kaganovich, Alexander V. Khrabrov, Hyo-Chang Lee, Kyoung-Jae Chung, Gwang-Seok Chae, SeungBo Shim, Donghyeon Na, June Young Kim, "Unintended Gas Breakdowns in Narrow Gaps of Advanced Plasma Sources for Semiconductor Fabrication Industry, Applied Physics Letters 123, 232108 (2023), https://doi.org/10.1063/5.0172566
94. Chan-Won Park, Benedek Horváth, Aranka Derzsi, Julian Schulze, Jung-Hyung Kim, Zoltan Donkó and Hyo-Chang Lee*, "Experimental validation of particle-in-cell/Monte Carlo collisions simulations in low-pressure neon capacitively coupled plasmas" Plasma Sources Science and Technology, 32 115003 (2023), DOI 10.1088/1361-6595/ad0432
93. Ho-Jin Ma*, Young-Jo Park, Mi-Ju Kim, Ha-Neul Kim, Jae-Woong Ko, Jae-Wook Lee, Jung-Hyung Kim, and Hyo-Chang Lee, "Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres", Applied Surface Science 641 158483 (2023), https://doi.org/10.1016/j.apsusc.2023.158483 JCR rank 1/23
92. Jinseok Choi+, Hee-Jung Yeom+, Gwang-Seok Chae, Wonchul Kee, Kwan-Yong Kim, Hyo-Chang Lee, Hyun-Dam Jeong*, Jung-
Hyung Kim*, "Influence of plasma parameters on low-k SiCOH film grown by plasma-enhanced chemical vapor deposition using
dimethyldimethoxysilane", Vacuum 217 112529 (2023). DOI : https://doi.org/10.1016/j.vacuum.2023.112529
91. Hee-Jung Yeom, Min Young Yoon, Daehan Choi, Young Seok Lee, Jung-Hyung Kim*, ShinJae You*, and Hyo-Chang Lee*, "The Role
of Oxygen in Amorphous Carbon Hard Mask Plasma Etching", ACS Omega 8, 36, 32450–32457(2023)
DOI : https://doi.org/10.1021/acsomega.3c02438
90. Young-Gi Kim, H. J. Yeom, Deuk-Chul Kwon, Kwan-Yong Kim, Gwang-Seok Chae, Jung-Sik Yoon, Junghyung Kim*, and Hyo-Chang
Lee*, "Effect of impurities in vacuum vessels on the plasma parameters in inductive discharges", Vacuum 215 112330 (2023).
DOI : https://doi.org/10.1016/j.vacuum.2023.112330
89. Min Young Yoon, Jong-Ryul Jeong, Hyo-Chang Lee*, and Jung-Hyung Kim*, "Plasma low-energy ion flux induced vertical graphene
synthesis", Applied Surface Science 636 (2023) 157814, JCR rank 1/23
DOI : https://doi.org/10.1016/j.apsusc.2023.157814
88. Dong Hyun Seo, Ju Won Kim, Jin‑Hoo Seong, Hyo‑Chang Lee, Sang‑il Kim, TaeWan Kim*, "Characteristics of rhombohedral (3R)
structure of α-In2Se3 nanosheets by mechanical exfoliation, Electronic Materials Letters", Electronic Materials Letters (2023).
DOI : https://doi.org/10.1007/s13391-023-00439-y
87. H. J. Yeom, Young-Gi Kim, Gwang-Seok Chae, Do-Yeon Hwang, Junghyung Kim*, and Hyo-Chang Lee*, "Analysis of the transmission
spectrum of the microwave cutoff probe influenced by the sheath around the probe", Journal of Applied Physics 133, 183302 (2023)
DOI : https://doi.org/10.1063/5.0145958
86. H. J. Yeom, Gwang-Seok Chae, Junghyung Kim*, ShinJae You* and Hyo-Chang Lee*, "Analysis of the transmission spectrum of the
flat-cutoff sensors on wafers with metal layer", Journal of Applied Physics 133 153302 (2023), Editor's Picks Paper
DOI : https://doi.org/10.1063/5.0143763
85. H. J. Yeom, Min Young Yoon, Gwang-Seok Chae, Junghyung Kim*, ShinJae You and Hyo-Chang Lee*, "Real-time monitoring of the
plasma density distribution in low-pressure plasmas using a flat-cutoff array sensor", Applied Physics Letters 122 114103 (2023)
DOI : https://doi.org/10.1063/5.0129790
2022
84. Youngseok Lee, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee*, and ShinJae You*,
"Database Development of SiO2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe",
Nanomaterials 2022 12 3828 (2022)
DOI : https://doi.org/10.3390/nano12213828
83. Ho Jin Ma*, Seongwan Hong, Hyeon-Myeong Oh, Kundan Kumar, Mi-Ju Kim, Ha-Neul Kim, Jae-Woong Ko, Jae-Wook Lee, Hyo-
Chang Lee, and Young-Jo Park*, "Correlation with the Microstructure and Synergistic Physiochemical Etching Resistance of
Nanocomposites under Fluorine-Containing Plasma Conditions", ACS Applied Materials and Interfaces 14 (2022)
DOI : https://doi.org/10.1021/acsami.2c12311
82. Kwan-Yong Kim, Jung Hyung Kim, Chin-Wook Chung, and Hyo-Chang Lee*, "Effect of electron energy distributions on the electron density in nitrogen inductively coupled plasmas", Plasma Sources Sci. technol. 31 105007 (2022)
DOI : https://doi.org/10.1088/1361-6595/ac942b
81. Min Young Yoon, H. J. Yeom, J. H. Kim, Jong-Ryul Jeong* and Hyo-Chang Lee*, "Plasma etching of the trench pattern with high aspect ratio mask under ion tilting", Applied Surface Science 153462 (2022), JCR rank 1/23
DOI : https://doi.org/10.1016/j.apsusc.2022.153462
80. Hyo-Chang Lee*, "Preface to Special Topic “Plasma Physics and Science in Current and Next Generation Semiconductor Process”:
Invited papers from The 8th International Conference on Microelectronics andPlasmaTechnology", Phys. Plasmas 29, 040401 (2022)
DOI : https://doi.org/10.1063/5.0093975
79. June Young Kim, Igors Kaganovich, and Hyo-Chang Lee*, "Review of the gas breakdown physics and nanomaterial-based ionization gas sensors and their applications", Plasma Sources Sci. Technol. 31 033001 (2022), Invited paper
DOI : https://doi.org/10.1088/1361-6595/ac4574
2021
78. Daehan Choi, Donghwan Kim, Yonghee Jo, J. H. Kim, Euijoon Yoon, Hyo-Chang Lee* and TaeWan Kim* , “Directly grown Te nanowire
electrodes and soft plasma etching for high-performance MoTe2 field-effect transistors”, Applied Surface Science 565 110521 (2021)
DOI : https://doi.org/10.1016/j.apsusc.2021.150521
77. H. J. Yeom, K. H. You, J. H. Kim and Hyo-Chang Lee*, “Circuit model for flat cut-off probes with coplanar capacitance”, Plasma
Sources Sci. Technol. 30 065012 (2021)
DOI : https://doi.org/10.1088/1361-6595/abef1a
76. Min Young Yoon, H. J. Yeom, J. H. Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong and Hyo-Chang Lee*,
“Discharge physics and atomic layer etching in Ar/C4F6 inductively coupled plasmas with a radio frequency bias”, Phys. Plasmas
28 063504 (2021), Featured article, Invited paper
DOI : https://doi.org/10.1063/5.0047811
75. Daehan Choi, J. H. Kim, Deuk Chul Kwon, Chae Ho Shin, Hyun Ryu, Euijoon Yoon and Hyo-Chang Lee*, “Crystalline silicon
nanoparticle formation by tailored plasma irradiation: self-structurization, nucleation and growth acceleration, and size control”,
Nanoscale. 5 15254 (2015), Back cover
DOI : https://doi.org/10.1039/d1nr00628b
74. Hyo-Chang Lee*, C-W Chung*, M. H. Lee, J. H. Kim, “Noninvasive method to measure the electron temperature in radio frequency
capacitively coupled plasmas”, Appl. Phys. Lett., 118 204101 (2021)
2020
73. Deuk-Chul Kwon*, Dong-Hun Yu, Hyoungcheol Kwon, Yeon Ho Im, Hyo-Chang Lee, “Global model for pulsed inductively coupled
plasma sources: Effect of edge-to-center density ratio and electron heating”, Phys. Plasmas. 27 073507 (2020)
DOI : https://doi.org/10.1063/5.0006505
72. Si Jun Kim, Jang Jae Lee, Young Seok Lee, H. J. Yeom, Hyo Chang Lee, Jung-Hyung Kim, Shin Jae You*, “Computational
Characterization of Microwave Planar Cutoff Probes for Non-Invasive Electron Density Measurement in Low-Temperature Plasma:
Ring- and Bar-Type Cutoff Probes”, Appl. Sci.10(20), 7066 (2020)
DOI : https://doi.org/10.3390/app10207066
71. Daehan Choi, H. J. Yeom, K. H. You, J. H. Kim, D. J. Seong, Euijoon Yoon, Hyo-Chang Lee*, “Generation of carbon nanowhiskers,
nanotips, and nanodots by controlling plasma environment: Ion energy and radical effects”, Carbon 162 (2020)
DOI : https://doi.org/10.1016/j.carbon.2020.02.068
70. H. J. Yeom, J. H. Kim, D. H. Choi, E. S. Choi, M. Y. Yoon, D. J. Seong, Shin Jae You, Hyo-Chang Lee*, “Flat cutoff probe for real-time
electron density measurement in industrial plasma processing”, Plasma Sources Sci. Technol. 29 035016 (2020).
2019
69. Hyo-Chang Lee*, Chin-Wook Chung*, J. H. Kim, D. J. Seong, “Electron energy distribution modification by RF bias in Ar/SF6
inductively coupled plasmas”, Appl. Phys. Lett., 115 064102 (2019)
DOI : https://doi.org/10.1063/1.5110219
68. H. J. Yeom, D. H. Choi, Y. S. Lee, J. H. Kim, D. J. Seong, S. J. You*, Hyo-Chang Lee*, “Plasma density measurement and downstream
etching of silicon and silicon oxide in Ar/NF3 mixture remote plasma source”, Plasma Sci. Technol. 21 064007 (2019)
DOI : https://doi.org/10.1088/2058-6272/ab0bd3
67. K. H. You, Julian Schulze, Aranka Derzsi, Zoltán Donkó, H. J. Yeom, J. H. Kim, D. J. Seong, Hyo-Chang Lee*, “Experimental and
Plasmas 26 013503 (2019)
2018
66. Birk Berger*, Kwangho You, Hyo-Chang Lee, Thomas Mussenbrock, Peter Awakowicz, Julian Schulze, “Observation of the generation
of multiple electron beams during a single sheath expansion phase in capacitive RF plasmas”, Plasma Sources Sci. Technol. 27
12LT02 (2018)
DOI : https://doi.org/10.1088/1361-6595/aaefc7
65. K. H. You, J. H. Kim, S. J. You, H. C. Lee, H Ruh, D. J. Seong*, “Gallium nitride nanoparticle synthesis using nonthermal plasma with
gallium vapor”, Current Applied Physics 18 1553-1557 (2018)
DOI : https://doi.org/10.1016/j.cap.2018.10.001
64. Daehan Choi, Tae-Wan Kim, Rauf Shahzad, Hyeji Park, H. J. Yeom, J. H. Kim, D. J. Seong, Sang-Woo Kang, Euijoon Yoon*, Hyo-
Chang Lee*, “Surface structurization and control of CuS particle size by discharge mode of inductively coupled plasma and vapor-
phase sulfurization”, Plasma Sources Sci. Technol. 27 114002 (2018)
DOI : https://doi.org/10.1088/1361-6595/aae8f6
63. Hyo-Chang Lee*, “Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics”, Applied Physics
Reviews 5, 011108 (2018)
DOI : https://doi.org/10.1063/1.5012001
62. Dongbin Kim, TaeWan Kim, Sang Hyun Park, Sung Kyu Lim, Hyo-Chang Lee, Taesung Kim, Sang-Woo Kang*, “Characterization of
spectrometer”, J. Vac. Sci. Technol. A, Vol. 36 021506 (2018)
2017
61. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
60. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
59. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
58. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
57. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
2016
56. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
55. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
54. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
53. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
52. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
2015
51. Seung-Ju Oh, Hyo-Chang Lee and Chin-Wook Chung, “Global model including multistep ionizations in helium plasmas”, Phys. Plasmas. (under-review).
50. C. Park, T. Parsons, D. Y. Kim, Tae S. Cho, Hyo-Chang Lee, Y.-C. Kim, C.-W. Chung, W. Zheng, M. Harju, B. Hendrix, T. Hawkins, J. Ballato, and S. Kim, “A flexible microplasma thruster that exhibits a switchable cold-to-thermal transition”, SCIENTIFIC REPORTS (under-review).
49. M. Nam, Hyo-Chang Lee (co-first author), Y. Hong, J. Han, Y. Kim , E. Choi, C.W. Chung, S. Jeon, J. Kim,, H. Rhim, “Effect of atmospheric pressure plasma jet on mitochondria”, Journal of Biomedical Nanotechnology (Accepted).
48. Hyo-Chang Lee and Chin-Wook Chung, “Effect of Electron Energy Distribution on the Hysteresis of Plasma Discharge: Theory, Experiment, and Modeling”, SCIENTIFIC REPORTS. 5 15254 (2015).
47. Y Kim, Hyo-Chang Lee, YS Kim, C-W Chung, “Correlation between vibrational temperature of N2 and plasma parameters in inductively coupled Ar/N2 plasmas”, Phys. Plasmas, 22 083512 (2015).
46. YC Kim, YS Kim, Hyo-Chang Lee, JH Moon , C-W Chung, YJ Kim , G Cho, “Non-invasive probe diagnostic method for electron temperature and ion current density in atmospheric pressure plasma jet source”, Phys. Plasmas, 22 083511 (2015).
45. Seung-Ju Oh, Hyo-Chang Lee, and Chin-Wook Chung, “Control of Spatial Power Deposition by Wireless Power Transfer Method Applicable to Inductively Coupled Plasma”, IEEE Trans. Plasma Sci, 43 2766 (2015).
44. D. Han, Hyo-Chang Lee, J. Y. Bang, C.W. Chung, S. Y. Moon, “Measurements of the spatially resolved electron temperature and plasma potential in ferrite-core side type Ar/He inductively-coupled plasmas”, Curr. Appl. Phys. 15 S1567 (2015).
43. Yu Sin Kim , Donghwan Kim , Hyo-Chang Lee, Chin-Wook Chung, "Pulsed plasma measurement method using harmonic analysis", J. Appl. Phys. 117 243302 (2015)
42. Hyo-Chang Lee and Chin-Wook Chung, “E-H heating mode transition in inductive discharges with different antenna sizes”, Phys. Plasmas, 22 053505 (2015).
41. Hyo-Chang Lee and Chin-Wook Chung, “Electron Heating and Control of Electron Energy Distribution for Enhancement of Plasma Ashing Processing”, Plasma Sources Sci. Technol., 24, 024001 (2015) [Selected to the Plasma Sources Science and Technology highlights of 2015 (http://iopscience.iop.org/0963-0252/page/Highlights-of-2015)].
40. Y-C Kim , J Y Kim, Hyo-Chang Lee, Y Kim, J Kim, S-W Cho, C.-W. Chung, “The experimental verification of the Boltzmann relation at the wall in inductively coupled plasmas”, Appl. Phys. Lett., 106, 074103 (2015).
39. S-H Kwon, HJ Choe, Hyo-Chang Lee, C-W Chung, J-J Lee, “Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting”, Journal of Nanoscience and Nanotechnology., 15 2542 (2015). 2015.03.01
38. S-H Kwon, HJ Choe, Hyo-Chang Lee, C-W Chung, J-J Lee, “Control of Size Uniformity of Cu Nanoparticle Array Produced by Plasma-Induced Dewetting”, Journal of Nanoscience and Nanotechnology., 15 2542 (2015). 2015.03.01
2014
37. Hyo-Chang Lee, Seongho Jeon, Jong-Man Kim, and Chin-Wook Chung, "Colorimetric Polydiacetylene for Plasma Diagnostics, Sensors and Actuators B, 203 130 (2014).
36. Young-Cheol Kim, Hyo-Chang Lee and Chin-Wook Chung, "Study on plasma uniformity by using 2D measurement method in argon inductively coupled plasmas, IEEE Trans. Plasma Sci, 42 2858 (2014).
35. Hyo-Chang Lee and Chin-Wook Chung, "Enhanced Plasma Uniformity in RF Plasma With Side Multihole, IEEE Trans. Plasma Sci, (in-press, 2014).
34. Hyung-Sik Han, Hyo-Chang Lee, Se-Jin Oh, and Chin-Wook Chung, "Measurement of sheath thickness at a floating potent, Phys. Plasmas, 21 023512 (2014).
33. June Young Kim, Hyo-Chang Lee, Dong-Hwan Kim, Yu-Sin Kim, Young-Cheol Kim, and Chin-Wook Chung, "Investigation of the Boltzmann relation in plasmas with non-Maxwellian electron distribution, Phys. Plasmas, 21 023511 (2014).
2013
32. Jin-Yong Kim, Hyo-Chang Lee, and Chin-WookChung, "Transition of electron kinetics in weakly magnetized inductively coupled Plasmas, Phys. Plasmas, 20 101612 (2013).
31. Hyo-Chang Lee and Chin-WookChung, "Effect of antenna size on electron kinetics in inductively coupled plasmas, Phys. Plasmas, 20 101607 (2013).
30. Young-Do Kim, Hyo-Chang Lee, and Chin-Wook Chung, "A study on the maximum power transfer condition in an inductively coupled plasma using transformer circuit model, Phys. Plasmas, 20 093508 (2013).
29. Dong-Hwan Kim, Hyo-Chang Lee, Yu Sin Kim, and Chin-Wook Chung, "Plasma diagnostic method using intermodulation fequencies in a Langmuir probe, Appl. Phys. Letts., 103 084103 (2013).
28. Soon-Ho Kwon, HanJoo Choe, Hyo-Chang Lee, Chin-Wook Chung, Jung-Joong Lee, , "Mechanism of Solid-State Plasma-Induced Dewetting for Formation of Copper and Gold Nanoparticles", Journal of Nanoscience and Nanotechnology, 13 6109 (2013).
27. Duksun Han, Hyo-Chang Lee, HJ Kim, Yu Sin Kim, Chin-WookChung, and Heesun
Chae, "Effects ofthe capacitor termination to antenna coil on the plasma parametersin radio frequency inductively coupled plasma", Plasma Sources Sci. Technol., 22 055011 (2013).
26. Hyo-Chang Lee, Dong-Hwan Kim, and Chin-Wook Chung, "Discharge mode transition and hysteresis in inductively coupled plasma", Appl. Phys. Letts., 102 234104 (2013).
25. Young-Cheol Kim, Sung-Ho Jang, Se-Jin Oh, Hyo-Chang Lee, and Chin-Wook Chung, "Two-dimensional-spatial distribution measurement of electron temperature and plasma density in low temperature plasmas", Rev. Sci. Instrum., 84 053505 (2013).
24. Su-Jin Lee, Hyo-Chang Lee, Jin-Young Bang, SeungJu Oh, and Chin-Wook Chung, "Mode transition of power dissipation and plasma parameters in an asymmetric capacitive discharge", Thin. Solid. Films, (in-press).
23. Hee-Jin Lee, Hyo-Chang Lee, Young-Cheol Kim and Chin-Wook Chung, "Control of plasma density distribution via wireless power transfer in an inductively coupled plasma", Plasma Sources Sci. Technol. FAST TRACK COMMUNICATION, 22 032002 (2013).
22. Hyo-Chang Lee, Hye-Ju Hwang, Young-Cheol Kim, June Young Kim, Dong-Hwan Kim, and Chin-Wook Chung, "Experimental verification of the Boltzmann relation in confined plasmas: Comparison of noble and molecule gases", Phys. Plasmas, 20 033504 (2013).
21. Young-Do Kim, Young-Kwang Lee, Hyo-Chang Lee, and Chin-Wook Chung, "Spatial measurements of electron energy distribution and plasma parameters in a weakly magnetized inductive discharge", Phys. Plasmas, 20 023505 (2013).
2012
20. Hyo-Chang Lee and Chin-Wook Chung, "Collisionless electron heating by radio frequency bias in low gas pressure inductive discharge", Appl. Phys. Lett, 101 244104 (2012).
19. Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung, "Effect of adding small
amount of inductive fields to O2, Ar/O2 capacitively coupled plasmas, J. Appl. Phys, 111 093301 (2012).
18. Hyo-Chang Lee and Chin-Wook Chung, "Variation of the electron energy distribution with He dilution in an inductively coupled argon discharge, Phys. Plasmas, 19 04350519 043505 (2012).
17. Hyo-Chang Lee and Chin-Wook Chung, "Experimental measurements of spatial plasma potentials and electron energy distributions in inductively coupled plasma under weakly collisional and nonlocal electron kinetic regimes", Phys. Plasmas, 19 03351419 033514 (2012).
16. Hyo-Chang Lee, SeungJu Oh, and Chin-Wook Chung, "Experimental observation of skin effect on plasma uniformity in inductively coupled plasmas with a radio frequency bias", Plasma Sources Sci. Technol., 21 035003 (2012).
15. Hyo-Chang Lee and Chin-Wook Chung, "Comparisons of the electrical characteristics by impedance matching conditions on the E–H and H–E transition and the hysteresis of inductively coupled plasma", Thin. Solid. Films, 521 185 (2012).
2011
14. Hyo-Chang Lee, Young-Chel Kim, and Chin-Wook Chung, "Evolution of Two-dimensional Plasma Density on the E-H heating Mode Transition in Planar-type Inductively Coupled Plasma", IEEE Trans. Plasma Sci , 39 11 (2011).
13. Young-Do Kim, You-Sin Kim, Hyo-Chang Lee, and Chin-Wook Chung, "Characteristics of probe current harmonics depending on various applied voltage waveforms in low temperature plasmas", Phys. Plasmas, 18 03350818 033508 (2011).
12. Jung-Kyu Lee, Hyo-Chang Lee, and Chin-Wook Chung, "E-H mode transition in inductively coupled plasma using Ar, O2, N2, and mixture gas", Curr. Appl. Phys., 11 S149 (2011).
11. Hyo-Chang Lee, Jin-Young Bang, and Chin-Wook Chung, "Effects of RF bias power on electron energy distribution function and plasma uniformity in inductively coupled argon plasma", Thin. Solid. Films, 519 7009 (2011).
10. Hyo-Chang Lee, Aram Kim, Se Youn Moon, and Chin-Wook Chung, "Observation of pressure gradient and related flow rate effect on the plasma parameters in plasma processing reactor", Phys. Plasmas, 18 02350118 023501 (2011).
2010
9. Gun-Ho Kim, Hyo-Chang Lee, and Chin-Wook Chung, "Experimental investigation of edge-to-center density ratio in inductively coupled plasmas", Phys. Plasmas, 17 07350417 073504 (2010).
8. Hyo-Chang Lee and Chin-Wook Chung, "Impedance transition and series resonance between bulk plasma and sheath in biased inductively coupled plasma", Thin. Solid. Films, 518 5219 (2010).
7. Min-Hyong Lee, Hyo-Chang Lee and Chin-Wook Chung, "Comparison of pressure dependence of electron energy distributions in oxygen capacitively and inductively coupled plasmas", PHYSICAL REVIEW E, 81 046402 (2010).
10. Hyo-Chang Lee, Jung-Kyu Lee, Seung-Ju Oh, and Chin-Wook Chung, "Inductively coupled RF heating of nano-particle for non-invasive and selective cancer cell destruction" Proc. 10th IEEE Conf. on Nanotechnology (IEEE-NANO2010), 1049-1051 (2010).
6. Hyo-Chang Lee, Jung-Kyu Lee, and Chin-Wook Chung, "Evolution of the electron energy distribution and E-H mode transition in inductively coupled nitrogen plasma", Phys. Plasmas, 17 03350617 033506 (2010).
5. Hyo-Chang Lee, Min-Hyong Lee, and Chin-Wook Chung, "Effects of rf-bias power on plasma parameters in a low gas pressure inductively coupled plasma", Appl. Phys. Lett, 96 071501 (2010).
4. Hyo-Chang Lee, Min-Hyong Lee, and Chin-Wook Chung, "Experimental observation of the transition from nonlocal to local electron kinetics in inductively coupled plasmas", Appl. Phys. Lett, 96 041503 (2010).
3. Hyo-Chang Lee, Min-Hyong Lee, and Chin-Wook Chung, "Low energy electron heating and evolution of the electron energydistribution by diluted O2 in an inductive Ar/O2 mixture discharge", Phys. Plasmas, 17 01350117 013501 (2010).
2008
2. Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung, "Observation of collisionless heating of low energy electrons in low pressure inductively coupled argon plasmas", Appl. Phys. Lett, 93 231503 (2008).
2007
1. Min-Hyong Lee, Hyo-Chang Lee, and Chin-Wook Chung, "Noninvasive method to measure the ion flux in capacitive discharge", Appl. Phys. Lett, 91 221505 (2007).
non-SCI journal
2024
6. Gwang-Seok Chae, Hee-Jung Yeom, Jung-Hyung Kim*, and Hyo-Chang Lee*, "Computational Study of the Electrical Conductivity of the Antenna on the Transmission Spectra of the Flat Cutoff Sensor", Appl. Sci. Converg. Technol. 33 (4); 80-82 (2024)
DOI : https://doi.org/10.5757/ASCT.2024.33.4.80
5. Hee-Jung Yeom, Gwang-Seok Chae, Jung-Hyung Kim*, and Hyo-Chang Lee*, "Computational Study on Transmission Spectra Considering Coaxial Cable of Cutoff Probes", Appl. Sci. Converg. Technol. 33(2): 41-44 (2024)
DOI : https://doi.org/10.5757/ASCT.2024.33.2.41
2023
4. Chan-Won Park, Hee-Jung Yeom, Hyo-Chang Lee*, and Jung-Hyung Kim*, "Analysis of the Characteristics of Radio Frequency Power Transmission Lines Using a Voltage Current Probe in Low-Pressure Discharge", Appl. Sci. Converg. Technol. 32(5): 118-121 (2023) DOI : https://doi.org/10.5757/ASCT.2023.32.5.118
3. M. Y. Yoon, H. J. Yeom, J R Jeong, Jung Hyung Kim*, Hyo-Chang Lee*, "Brief Review of Atomic Layer Etching Based on
Radiofrequency-Biased Ar/C 4 F 6 -Mixture-Based Inductively Coupled Plasma Characteristics", Appl. Sci. Converg. Technol. 32 (2):
DOI : https://doi.org/10.5757/ASCT.2023.32.2.34
2020
2. H. J. Yeom, Jang Jae Lee, Si Jun Kim, Young Seok Lee, Chul hee Cho, Jung Hyung Kim, Hyo-Chang Lee, ShinJae You*, "Mass Filter
2019
1. Hyo-Chang Lee*, "A Brief Review of Electron Kinetics in Radio-Frequency Plasmas", Appl. Sci. Converg. Technol. 28 (4): 79-81 (2019)
Conference
2024
19. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "DC / RF 스퍼터링 공정에서 외부변수에 따른 구리 박막 특성 분석 및 플라즈마와의 상관관계 분석", 정찬기, 채광석, 이효창*
18. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "Effect of Pure Oxygen Plasma on the Etching Properties of Amorphous Carbon Layer Hard Mask", 최은범, 채광석, 이효창*
17. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "Exploring the wave transmissions on the cutoff probe with diffrent geometry for price plasma density measurement", 이재헌, 염희중, 채광석, 김정형*, 이효창*
16. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "Effect of t he Ar plasma rate coefficients on the global model", 강형석, 채광석, 김정형*, 이효창*
15. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "Effects of gap length, bias voltage, and gas pressure on the plasma uniformity in radio-frequency capacitively coupled plasmas", 박찬우, 박찬원, 채광석, 김정형*, 이효창*
14. 2024.02.15, 제 66회 한국진공학회 하계정기학술대회, 평창, "Correlation between electron density decay and electron energy distribution in pulsed inductively coupled plasmas", 박준형, 채광석, 김정형*, 이효창*
13. 2024. 01.17, The 9th ICMAP, 제주, "Study on the Electron Density Characteristics of the Pulsed Inductively Coupled Plasma by Using a Fourier Cut-off Method", 박준형, 채광석, 김정형*, 이효창*
12. 2024. 01.17, The 9th ICMAP, 제주, "Exploring the wave transmissions on the cutoff probe with different geometry for precise plasma density measurement", 이재헌, 염희중, 채광석 김정형*, 이효창*
2023
11. 2023.08.22, 제 65회 한국진공학회 하계정기학술대회, 제주도, "패치형 평판 컷오프 센서의 플라즈마 측정 특성 분석", Gwang-Seok Chae, H.J. Yeom,, Jung-Hyung Kim, Hyo-Chang Lee*
10. 2023.08.22, 제 65회 한국진공학회 하계정기학술대회, 제주도, "RF 바이어스 전압이 인가된 유도결합 플라즈마에서 Ar 이온 포격을 이용한 실리콘 ripple 패턴의 형성 연구", 윤민영, 염희중, 정종율, 김정형*, 이효창*
9. 2023.08.22, 제 65회 한국진공학회 하계정기학술대회, 제주도, "유도 결합 플라즈마-화학 기상 증착에서 Ar/NH3/SiH4 혼합기체를 이용한 실리콘 질화막의 증착 특성에 대한 연구", 성진후, 윤민영, 채광석, 황도연, 최석현, 조용재, 김태완, 이효창*, 김정형*
8. 2023.08.21, 제 65회 한국진공학회 하계정기학술대회, 제주도, "Ar/SiH4 유도결합 플라즈마에서의 전자에너지분포 특성 연구", Seong-Hyeon Kim, Hee-Jung Yeom, Chin-Jung Yeom, Hyo-Chang Lee* and Jung-Hyung Kim
7. 2023.08.21, 제 65회 한국진공학회 하계정기학술대회, 제주도, "유도결합 플라즈마에서 N_2, Argon 혼합기체 내의 N_2 회전온도와 혼합 기체온도의 상관분석", 황도연, 김영기, 염희중, 채광석, 이가원, 김정형*, 이효창*
6. 2023.08.21, 제 65회 한국진공학회 하계정기학술대회, 제주도, "Influence of plasma parameters on low-k SiCOH film grown by plasma- enhanced chemical vapor deposition using dimethyldimethoxysilane", Seong-Bin Park, Jinseok Choi, H. J. Yeom, Gwang-seok Chae, Kwan-Yong Kim, Wonchul Kee, Hyo-Chang Lee, Hyun-Dam Jeong and Jung-Hyung Kim
5. 2023.08.20, 제 65회 한국진공학회 하계정기학술대회, 제주도, "평판형 컷오프 센서의 플라즈마 측정 특성 분석", 염희중, 윤민영, 채광석, 최은석, 유신재*, 김정형* and 이효창*
4. 2023.02.09, 제 64회 한국진공학회 동계정기학술대회, 횡성, "위상분해 광방출 분광법을 이용한 저밀도 용량성 결합 플라즈마의 고에너 지 전자빔 거동 분석 및 비간섭식 전자밀도 진단법", Chan-Won Park, Birk Berger, Julian Schulze, Jung-Hyung Kim, Hyo-Chang Lee*
3. 2023.02.08, 제 64회 한국진공학회 동계정기학술대회, 횡성, "Formation of silver quantum dot using a RF-biased inductively coupled plasma", 성진후, 최진석, Min Young Yoon, Jung-Hyung Kim, 김태완, Hyo-Chang Lee*
2. 2023.02.08, 제 64회 한국진공학회 동계정기학술대회, 횡성, "극자외선 유도 수소 플라즈마에 의한 물질 손상 연구", Eun-Seok Choe, 최승욱, 김안순, Kwan-Yong Kim, H J Yeom, Min Young Yoon, Seong Wan Hong, Jung-Hyung Kim, 김동욱, Hyo-Chang Lee
1. 2023.02.08, 제 64회 한국진공학회 동계정기학술대회, 횡성, "다단이온화 Global model으로 모사한 아르곤 유도결합플라즈마에서 외부 변수 변화에 따른 플라즈마 변수 분석", 황도연, 반재왕, 권득철, 염희중, 이효창, 이가원, 김정형*
2022
27. 2022.11.16, KISM 2022, 부산, "Plasma Sensor for Intelligent Semiconductor/Display Process", H-C Lee, H J Yeom, J H Kim, S J You, K H You, D H Choi, E S Choi, M Y Yoon, and D J Seong
26. 2022.11.16, KISM 2022, 부산, "Plasma Density Spatial Distribution Measurement Using Flat Cutoff Array Sensor in Low-Pressure Plasmas", Hee Jung Yeom, Min Young Yoon, Gwang-Seok Chae, Jung Hyung Kim, and Hyo-Chang Lee*
25. 2022.11.14, KISM 2022, 부산, "A Quantitative Evaluation System for EUV Material Damage Caused by Hydrogen Plasma", Eun-Seok Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, H. J. Yeom, Min Young Yoon, Seongwan Hong, Jung- Hyung Kim, Dong-Wook Kim , and Hyo-Chang Lee*
24. 2022.11.14, KISM 2022, 부산, "Plasma Etching of High Aspect Ratio Trench Pattern under Ion Tilting", Min Young Yoon, Hee Jung Yeom, Jung-Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
23. 2022.08.19, 대한기계학회, 제주도, "플라즈마 측정기술기반 내플라즈마 세라믹 소재부품 표준화 평가기술", Hyo-Chang Lee, Seong Wan Hong, Chan-Won Park, and Jung Hyung Kim, Invited talk
22. 2022.10.14, AAPPS-DPP2022, Virtual, "Discharge physics of radio-frequency plasmas and its applications to the nanomaterial
fabrication", Hyo-Chang Lee, Invited talk
21. 2022.09.20, E-MRS 2022 Fall Meeting (Poland), "Directly grown Te nanowire electrodes and soft inductive-plasma etching for high-
performance MoTe2 field-effect transistors", Hyo-Chang Lee, and Jung Hyung Kim
20. 2022.09.15, Theory of fusion plasma (Italy), "RF heating mode transition, hysteresis, and applications of inductive discharges",
Hyo-Chang Lee, and Jung Hyung Kim
19. 2022.08.23, i-FPC 2022, 제주도, "Real-time, Non-Perturbing, and Precise Plasma Sensor for Intelligent Semiconductor/Display
Process Equipment", Hyo-Chang Lee, and Jung Hyung Kim, Invited talk
18. 2022.08.19, 제 63회 한국진공학회 동계정기학술대회, 제주도, "Formation of platinum nanoparticles by plasma-assisted dewetting",
최진석, and Hyo-Chang Lee*
17. 2022.08.18, 제 63회 한국진공학회 동계정기학술대회, 제주도, "Effect of impurity of a vacuum vessel on the plasma parameters in
inductively coupled plasmas", Young-Gi Kim, Hee Jung Yeom, Kwan-Yong Kim, Deuk-Chul Kwon, Jung-Sik Yoon, Jung Hyung
Kim, and Hyo-Chang Lee*
16. 2022.08.18, 제 63회 한국진공학회 동계정기학술대회, 제주도, "저밀도 용량성 결합 플라즈마에서 위상분해 광방출 분광법을 이용한
비간섭식 전자밀도 진단법 개발", Chan-Won Park, B. Berger, J. Schulze, Jung Hyung Kim, and Hyo-Chang Lee*
15. 2022.08.18, 제 63회 한국진공학회 동계정기학술대회, 제주도, "플라즈마 변수 제어를 통한 vertical graphene의 증착 특성 및 성장
메커니즘 연구", Min Young Yoon, Jung Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
14. 2022.08.17, 제 63회 한국진공학회 동계정기학술대회, 제주도, "플라즈마 노출 시간에 따른 내플라즈마성 세라믹 소재의 부식 특성
연구", Seong Wan Hong, Jung Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
13. 2022.08.17, 제 63회 한국진공학회 동계정기학술대회, 제주도, "유전체 매립 모사환경에서의 평판형 컷오프 센서의 플라즈마 측정 특성
분석", Gwang-Seok Chae, Hee Jung Yeom, Hyo-Chang Lee, Dong-Wook Kim, and Jung Hyung Kim*
12. 2022.08.17, 제 63회 한국진공학회 동계정기학술대회, 제주도, "수소 플라즈마에 의한 EUV 물질 손상의 정량적 평가 시스템", Eun Seok
Choe, Seungwook Choi, Ansoon Kim, Kwan-Yong Kim, Hee Jung Yeom, Min Young Yoon, Seong Wan Hong, Jung Hyung Kim, Dong-
Wook Kim, and Hyo-Chang Lee*
11. 2022.05.24, 49th International Conference on Plasma Science (ICOPS), Virtual, "A study on the growth mechanism of vertical
graphene grown using inductively coupled plasma", Min Young Yoon, Hyo-Chang Lee, and Jung Hyung Kim*
10. 2022.04.15, 2022 한국세라믹학회 춘계학술대회, 여수, "내플라즈마 세라믹 소재 부품의 표준화 평가 기술", Hyo-Chang Lee*,
Invited talk
9. 2022.04.13, 2022 한국세라믹학회 춘계학술대회, 여수, "플라즈마 변수에 따른 내플라즈마성 세라믹 소재의 식각 특성 연구 및
데이터베이스 구축", Seong Wan Hong, Jung Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
8. 2022.02.09, Semicon Korea 2022, 서울, "Process Plasma Measurement Technology and Materials/Parts/Equipment Reliability
Evaluation Method", Hyo-Chang Lee, Invited talk
7. 2022.02.17, 제 62회 한국진공학회 동계정기학술대회, 강원도, "Effect of impurity of a vacuum vessel on the plasma parameters in
inductively coupled plasmas", Young-Gi Kim, Kwan-Yong Kim, Hee Jung Yeom, Jung-Hyung Kim, Hyo-Chang Lee*
6. 2022.02.17, 제 62회 한국진공학회 동계정기학술대회, 강원도, "플라즈마 변수에 따른 세라믹 소재의 내플라즈마 특성 연구", Seong
Wan Hong, Jung Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
5. 2022.02.17, 제 62회 한국진공학회 동계정기학술대회, 강원도, "ICP-RF bias system과 Ar/C4F6 혼합 가스에서의 플라즈마 특성 분석을
통한 원자층 식각에 대한 연구",Min Young Yoon, Hee Jung Yeom, Jung Hyung Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon,
Jong-Ryul Jeong, and Hyo-Chang Lee*
4. 2022.02.17, 제 62회 한국진공학회 동계정기학술대회, 강원도, "평판형 컷오프 프로브를 이용한 플라즈마 밀도 균일도 측정", Hee Jung Yeom, K. H. You, Min Young Yoon, Gwang-Seok Chae, Jung Hyung Kim, and Hyo-Chang Lee*
3. 2022.01.26, 제 29회 한국반도체학술대회, 강원도, "세라믹 소재의 내플라즈마 특성과 플라즈마 변수의 상관관계 분석", Seong Wan Hong, Jung Hyung Kim, Jong-Ryul Jeong, and Hyo-Chang Lee*
2. 2022.01.26, 제 29회 한국반도체학술대회, 강원도, "Ar/C4F6 혼합가스와 ICP-RF bias system 에서의 플라즈마 특성 분석을 통한 원자층 식각에 대한 연구", Min Young Yoon, Hee Jung Yeom, Jung Hyung Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul
Jeong, and Hyo-Chang Lee*
1. 2022.01.26, 제 29회 한국반도체학술대회, 강원도, "평판형 컷오프 프로브 측정 특성 분석 및 플라즈마 밀도 균일도 측정", Hee Jung
Yeom, K. H. You, Min Young Yoon, Gwang-Seok Chae, Jung Hyung Kim, and Hyo-Chang Lee*
2021
18. 2021.10.21, 2021 KPS Fall Meeting, KPS, Virtual, "A comprehensive study on discharge physics and quasi-atomic layer etching using a radio-frequency biased inductively coupled plasma in Ar/C4F6 mixture", Min Young Yoon, Hee Jung Yeom, Jung Hyung Kim,
Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong, and Hyo-Chang Lee*
17. 2021.10.06, Gaseous Electronics Conference (GEC), APS, Virtual, "A study on the self-consistent step-wise global model: chamber geometry effect", Jae Wang Ban, Deuk-Chul Kwon, H. J. Yeom, Jung-Hyung Kim, Shin Jae You, and Hyo-Chang Lee*
16. 2021.10.06, Gaseous Electronics Conference (GEC), APS, Virtual, "Development of flat cutoff probe for real-time electron density
measurement", H. J. Yeom, J. H. Kim, DaeHan Choi, Eun Seok Choe, Min Young Yoon, G. H. You, ShinJae You, and Hyo-Chang Lee*
15. 2021.10.06, Gaseous Electronics Conference (GEC), APS, Virtual, "A comprehensively study on the discharge physics and atomic
layer etching with radio frequency biased inductively coupled plasma in Ar/C4F6 mixture", Min Young Yoon, Hee Jung Yeom,
Jung Hyung Kim, Won Chegal, Yong Jai Cho, Deuk-Chul Kwon, Jong-Ryul Jeong, and Hyo-Chang Lee*
14. 2021.10.06, Gaseous Electronics Conference (GEC), APS, Virtual, "A new atmospheric pressure plasma jet source with two plasma
regions", Eun Seok Choe, Jung-Hyung Kim, Dong-Wook Kim, and Hyo-Chang Lee*
13. 2021.10.05, Gaseous Electronics Conference (GEC), APS, Virtual, "Laser scattering diagnostic system in Korea Research Institute of
Standards and Science", Young-Gi Kim, Jung-Hyung Kim, Hyo-Chang Lee*
12. 2021.10.04, Gaseous Electronics Conference (GEC), APS, Virtual, "Wave-cutoff probe: overview and achievements", Hyo-Chang Lee*
Invited talk
11. 2021.08.20, 제61회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "하이브리드 플라즈마 소스에서 회로 모델을 이용한
전자 직렬 공진 분석", Chan-Won Park, Jung-Hyung Kim, Shin-Jae You, and Hyo-Chang Lee*
10. 2021.08.20, 제61회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "다단 이온화 global model 을 통한 챔버 geometry 변화에
의한 플라즈마 변수 연구", Jae Wang Ban, Deuk-Chul Kwon, H. J. Yeom, Jung-Hyung Kim, Shin Jae You, and Hyo-Chang Lee*
9. 2021.08.20, 제61회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "CVD-SiC의 저항에 따른 내플라즈마 특성 연구", Seongwan
Hong, Jung Hyung Kim, Jong-Ryul Jeong, Hyo-Chang Lee*
8. 2021.08.20, 제61회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "회로모델링을 통한 평판형 컷오프 프로브 특성 분석", H. J.
Yeom, G. H. You, J. H. Kim, Hyo-Chang Lee*
7. 2021.08.20, 제61회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "Ar/C4F6 혼합 가스에서 ICP-RF bias system을 이용한 양산형
원자층 식각기술과 플라즈마 특성에 대한 연구", Min Young Yoon, Hee Jung Yeom, Jung Hyung Kim, Won Chegal, Yong Jai Cho,
Deuk-Chul Kwon, Jong-Ryul Jeong, Hyo-Chang Lee*
6. 2021.01.20, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "Circuit analysis of the plasma electron series resonance in hybrid plasma reactors", Chan-Won Park, Jung-Hyung Kim, and Hyo-Chang Lee*
5. 2021.01.20, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "Analysis of plasma parameters and discharge property using self-consistent stepwise global model in inductively coupled plasmas", Jae Wang Ban,
Hee Jung Yeom, Jung-Hyung Kim, Shin Jae You, and Hyo-Chang Lee*
4. 2021.01.20, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "Development of flat cutoff
probe for real-time electron density measurement", H. J. Yeom, J. H. Kim, ShinJae You, Hyo-Chang Lee*
3. 2021.01.20, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "Effects of power transfer type
and needle shape on the discharge characteristics of needle-type atmospheric pressure plasma source", Eun Seok Choe,
Jung-Hyung Kim, Dong-Wook Kim, Hyo-Chang Lee*
2. 2021.01.20, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "A study on the atomic layer
etching using radio-frequency biased inductively coupled plasma in Ar/C4F6 mixture", Min Young Yoon, Jung Hyung Kim,
Jong-Ryul Jeong, Hyo-Chang Lee*
1. 2021.01.19, 8th International Conference on Microelectronics and Plasma Technology (ICMAP), Jeju, "Hysteresis Physics in Inductively
Coupled Plasmas", Hyo-Chang Lee*, Invited talk
2020
7. 2020.10.19, Asia-Pacific Conference on Plasma Physics (Japan), "Discharge physics of inductively coupled plasmas (Invited)",
Hyo-Chang Lee*
6. 2020.08.21, 제59회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "고종횡비 식각 공정에서 Edge Ring에 의한 이온 Tilting 모사
및 식각 Profile 분석 연구", Min Young Yoon, Hee Jung Yeom, Jong-Ryul Jeong, Dae Jin Seong, Jung Hyung Kim, Hyo-Chang
Lee*
5. 2020.08.21, 제59회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "전극 구조에 따른 대기압 플라즈마 방전 특성 연구",
Eun Seok Choe, Dae-Jin Seong, Jung-Hyung Kim, Dong-Wook Kim, Hyo-Chang Lee*
4. 2020.08.19, 제59회 한국진공학회 하계정기학술대회, KVS, 소노캄 (제주), "평판형 컷오프 프로브의 회로 모델링 연구", H. J. Yeom, G. H.
You, J. H. Kim, D. J. Seong, ShinJae You, Hyo-Chang Lee*
3. 2020.02.11, 제58회 한국진공학회 동계정기학술대회, KVS, 하이원리조트 (정선), "공정 중 실시간 전자밀도 측정을 위한 평판형 컷오프
프로브 연구", H. J. Yeom, J. H. Kim, DaeHan Choi, Eun Seok Choe, Min Young Yoon, D. J. Seong, ShinJae You, Hyo-Chang Lee*
2. 2020.02.09, 제58회 한국진공학회 동계정기학술대회, KVS, 하이원리조트 (정선), "리튬이온전지 음극 소재용 Graphene-Si stack
구조 제작에 대한 연구", Min Young Yoon, Dae Han Choi, Hee Jung Yeom, Jong-Ryul Jeong, Dae Jin Seong, Hyo-Chang Lee,
Jung Hyung Kim*
1. 2020.02.09, 제58회 한국진공학회 동계정기학술대회, KVS, 하이원리조트 (정선), "용량성 결합 플라즈마에서 위상분해광방출 진단법을
이용한 전자가열 및 전자빔 거동 이해와 이를 통한 플라즈마 밀도 측정 기술 개발", Eun Seok Choe, Jung-Hyung Kim, Dae-Jin
Seong, Hee-Jung Yeom, Dong-Wook Kim, Hyo-Chang Lee*
2019
9. 2019.10.22, AVS 66th international Symposium & Exhibition, 미국, "Characteristics of Magnetized High Density Plasma and its
Applications", Jung-Hyung Kim
8. 2019.10.29, Gaseous Electronics Conference (GEC), APS, 미국, "Experimental and computational investigations of the electrode gap
length e ect on capacitively coupled radio frequency oxygen discharges", Hyo-Chang Lee
7. 2019.10.23, APS DPP, 미국, "EEDF effect on the plasma hysteresis: Theory, Experiment, and Modeling in RF inductive plasmas",
Hyo-Chang Lee
6. 2019.08.12, 제57회 한국진공학회 하계정기학술대회, 비발디파크 (홍천), "Ar, Kr, Xe / O2/C4F6/CH2F2혼합가스 용량성 결합 플라즈마에
서의 산소 유량 증가에 따른 SiO2및 ACL patterned-wafer 식각", Hee Jung Yeom
5. 2019.08.12, 제57회 한국진공학회 하계정기학술대회, 비발디파크 (홍천), "Plasma-assisted generation of carbon nano-whisker and
nano-tip", Dae Han Choi
4. 2019.07.12, EPS 2019, 이탈리아, "Studies on the plasma parameters and electron heating mechanism in RF biased inductive
discharges", Hyo-Chang Lee
3. 2019.07.02, IVC 2019, 스웨덴, "Coupling of plasma power and electron temperature in RF plasmas", Hyo-Chang Lee
2. 2019.02.20, 제56회 한국진공학회 동계정기학술대회, 비발디파크 (홍천), "Analysis of low mass noise in quadrupole mass
spectrometer", Hee Jung Yeom
1. 2019.02.19, 제56회 한국진공학회 동계정기학술대회, 비발디파크 (홍천), "유도 결합 플라즈마의 방전 모드에 따른 Cu 나노입자 크기 및
분포 변화", Dae Han Choi
2018
7. 2018.11.06, Gaseous Electronics Conference (GEC), APS, 미국, Hyo-Chang Lee
6. 2018.10.25, American Vacuum Society International Symposium, 미국, Hyo-Chang Lee
5. 2018.07.04, European Physical Society Conference, 체코, Hyo-Chang Lee
4. 2018.08.08, 제55회 한국진공학회 하계정기학술대회, 비발디파크 (홍천), Hee Jung Yeom
3. 2018.08.08, 제55회 한국진공학회 하계정기학술대회, 비발디파크 (홍천), Dae Han Choi
2. 2018.07.26, The 7th international conference on microelectronics and plasma technology, 송도 컨벤시아 (인천), Hee Jung Yeom
1. 2018.07.25, The 7th international conference on microelectronics and plasma technology, 송도 컨벤시아 (인천), Dae Han Choi
Patent
2024
19. 2025.03.12. 한국, 출원, 진공게이지 오염방지부 및 이를 구비하는 반도체 제조장치, (이효창, 김정형, 성진후)
출원번호: 10-2025-0030144
18. 2024.11.08. 한국, 출원, 프로브를 이용한 플라즈마 측정장치, (이효창,김정형,신지수,반재왕,김성은)
출원번호: 10-2024-0115870
17. 2024.11.18. 한국, 등록, 도핑농도 또는 결정성 측정 장치, 이를 구비하는 공정 시스템 및 측정 방법, (이효창,김정형)
등록번호: 10-2731540
16.2024.10.10. 한국, 등록, 진공펌프 성능 유지 장치, 이를 구비하는 진공펌프 및 플라즈마 공정 시스템, (이효창,김정형)
등록번호: 10-2718476
15. 2024.07.03. 한국, 등록, 플라즈마 진단 장치, 이를 구비하는 플라즈마 공정 시스템 및 공정 방법, (이효창, 김정형)
등록번호 : 10-2682626
14. 2024.07.03. 한국, 등록, 플라즈마 진단 장치, 이를 구비하는 플라즈마 공정 시스템 및 공정 방법, (이효창, 김정형)
등록번호 : 10-2682626
13. 2024.04.03. 한국, 등록, 광학적 플라즈마 주파수 측정 장치, 이를 구비하는 측정 시스템 및 측정 방법, (이효창, 김정형)
등록번호 : 10-2655690
12. 2024.02.07. 한국, 출원, 지향성 강화 플라즈마 진단 장치, 이를 구비하는 웨이퍼형 진단 장치 및 정전척, (이효창, 김정형, 채광석, 염희중)출원번호 : 10-2024-0019264
11. 2024.01.29. 한국, 등록, 플라즈마 진단기능 및 유전체 두께 측정기능을 갖는 센서, 이를 구비하는 공정장치 및 공정시스템, (이효창, 김정형) 등록번호 : 10-2632552
10. 2024.01.10. 한국, 등록, 오염 입자 포집부와 이를 포함하는 극자외선 노광 장치, (이효창, 김정형, 박인용)
등록번호 : 10-2625228
9. 2024.02.07. 한국, 출원, 지향성 강화 플라즈마 진단 장치, 이를 구비하는 웨이퍼형 진단 장치 및 정전척, (이효창, 김정형, 채광석, 염희중)
출원번호 : 10-2024-0019264
8. 2024.01.09. 미국, 등록, Planar-type plasma diagnosis apparatus, wafer-type plasma diagnosis apparatus in which planar-type plasma diagnosis apparatus is buried, and electrostatic chuck in which planar-type plasma diagnosis apparatus is buried , (이효창, 김정형,성대진,염희중)
등록번호 : US 11867643 B2
2023
7. 2023.10.31, 한국, 등록, 플라즈마 진단기능을 갖는 정전척, (이효창, 김정형)
6. 2023.10.26, 한국, 등록, 오염 입자 차단부와 이를 포함하는 극자외선 노광 장치,(이효창, 김정형, 박인용)
5. 2023.06.29, 한국, 등록, 헬리콘 플라즈마 빔 극자외선 발생 장치, (김정형, 이효창)
4. 2023.06.16, 한국, 출원, 고효율 EUV 광방출 장치 및 그 방법, (김정형, 이효창, 염희중)
3. 2023.06.16, 한국, 출원, EUV 광원에 의한 광학부품 오염 방지 장치 및 그 방법, (김정형, 이효창, 염희중)
2. 2023.02.06, 한국, 출원, 반도체 양자점의 생성과 크기 제어 방법 및 시스템, (이효창, 김정형)
1. 2023.02.06, 한국, 출원, 플라즈마를 이용한 나노입자 합성, 집속 및 수집 장치 및 방법, (김정형, 이효창, 윤민영)
2022
8. 2022.11.17, 한국, 출원, 이차전지 음극재용 복합체, 이를 제조하는 제조장치 및 제조방법, (김정형, 이효창, 최진석, 윤민영)
7. 2022.08.04, 일본, 등록, Device for measuring plasma ion density and apparatus for diagnosing plasma using the same, (이효창,
김정형, 염희중)
6. 2022.06.16, 일본, 등록, Flat type plasma diagnosis device, wafer type plasma diagnosis device with embedded flat type plasma
diagnosis device, electrostatic chuck with embedded flat type plasma diagnosis device, (이효창, 김정형, 성대진, 염희중)
5. 2022.04.19, 한국, 출원, 광학적 플라즈마 주파수 측정 장치, 이를 구비하는 측정 시스템 및 측정방법, (이효창, 김정형)
4. 2022.03.13, 한국, 출원, 진공펌프 성능 유지 장치, 이를 구비하는 진공펌프 및 플라즈마 공정 시스템, (이효창, 김정형, 강상우, 김준오,
문지훈, 제갈원)
3. 2022.01.21, 한국, 출원, 도핑농도 또는 결정성 측정 장치, 이를 구비하는 공정 시스템 및 측정 방법, (이효창, 김정형, 강상우, 염희중)
2. 2022.01.21, 한국, 출원, 펠리클 성능 평가 시스템 및 방법, (이효창, 김정형, 김정원, 제갈원, 강상우)
1. 2022.01.21, 한국, 출원, 플라즈마 진단 장치, 이를 구비하는 플라즈마 공정 시스템 및 공정 방법, (이효창, 김정형)
2021
6. 2021.12.14, 한국, 등록, 플라즈마 이온 밀도 측정 장치와 이를 이용한 플라즈마 진단 장치, (이효창, 김정형, 염희중)
5. 2021.07.23, 한국, 출원, 플라즈마 진단기능 및 유전체 두께 측정기능을 갖는 센서, 이를 구비하는 공정장치 및 공정시스템, (이효창,
김정형)
4. 2021.07.06, 한국, 출원, 플라즈마 진단기능을 갖는 정전척, (이효창, 김정형)
3. 2021.(04.01,일본), (04.05,미국), (04.07,유럽), (04.07,중국), 출원, Device for measuring plasma ion density and Apparatus for plasma
diagnostics using the same, (이효창, 김정형, 염희중)
2. 2021.03.24, 한국, 출원, 헬리콘 플라즈마 빔 극자외선 발생 장치, (김정형, 이효창 )
1. 2021.02.19, 한국, 출원, 플라즈마 이온 밀도 측정 장치와 이를 이용한 플라즈마 진단 장치, (이효창, 김정형, 염희중)
2020
1. 2020.(10.23,미국), (10.27,중국), (10.29,유럽), (11.17,일본) PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS, WAFER-TYPE
PLASMA DIAGNOSIS APPARATUS IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IN BURIED, AND ELECTROSTATIC
CHUCK IN WHICH PLANAR-TYPE PLASMA DIAGNOSIS APPARATUS IN BURIED, (이효창, 김정형, 성대진, 염희중 )
기술이전
2. 통상실시권, 평면형 플라즈마 측정기술, (주) 쎄미콤
1. 통상실시권, 평면형 플라즈마 측정기술, (주) 파웰코퍼레이션