Hyo-Chang Lee is a professor at the Korea Aerospace University (KAU). Before joining KAU, he was a lecture/research professor at Hanyang University (2012-2015), a senior researcher in the Etch Technology Team, Memory Division, at Samsung Electronics (2015-2016), and principal research scientist at Korea Research Institute of Standards and Science (2016-2023). His work ranges from fundamental plasma physics (electron heating in ICPs and CCPs, control of electron energy distribution functions, plasma diagnostics) to applications (etching/deposition/ashing, nanomaterials generation, plasma surface interaction). He developed a variety of models and diagnostic tools. He received various awards such as the Korea Prime Minister Award of Invention Competition (2021), the 2020 Hershkowitz Early Career Award (2021), The KRISS prizes (2018, 2020), and IEEE senior member, as well as the Excellence Award for his Dissertation of Hanyang University (2012). He has published over 100 scientific papers including invited reviews, such as “Review of inductively coupled plasmas: Nano-applications and bistable hysteresis physics”, Applied Physics Reviews 5, 011108 (2018).